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Influence of new technique of 'oil thermal annealing (OTA)' on the nanostructured ITO coated films which improve adhesion strength, electrical conductivity and optical properties (transmittance) is revealed. The X-ray diffraction measurement (XRD) used to investigate the properties of nano structure films when the annealing temperature increases from 150 to 300uC. Surface characteristics of ITO films were investigated by different methods revealed the improvement in their surface properties due to oil thermal annealing treatment in comparison with as deposited films. Annealing is used to reduce inherent defects that may be introduced during the prepared thin film and cooling processes. The ITO film significantly presents a higher electrical conductivity of 38?6610 3 V 21 cm 21 , as compared with as deposited films (y0?909610 3 V 21 cm 21 ). The proposed technique is useful in photonic device applications.

Indium tin oxide‐coated thin films (200 nm) are deposited on glass substrates by using R.f. sputtering technique. Here, we investigate the influence of new technique of treatment, which is called as “oil thermal annealing” on the nano‐structured indium tin oxide thin films at fixed temperature (150 °C) which improves adhesion strength, electrical conductivity and optical properties (transmittance) of the films. Oil thermal annealing is used to reduce inherent defects that may be introduced during the prepared thin film and cooling processes. Proposed technique is highly suitable for liquid crystal displays, solar cells and organic light emitting diodes, and many other display‐related applications.

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