An oxidative chemical vapor deposition (CVD) process is presented as an alternative to conventional solution-based processing of poly(3,4-ethylenedioxythiophene) (PEDOT) thin films. This solventless technique yields PEDOT with higher conductivities and conformally coats fibers and other high area morphologies, important for enhancing efficiencies in some organic electronic devices. The CVD method eliminates corrosive poly(styrenesulfonate) that is used to disperse PEDOT in an aqueous suspension for solution-based processing. A mechanistic approach is presented that favors the deposition of the conjugated, conducting form of PEDOT. We achieved conductivities as high as 105 S/cm and demonstrated films about 100 nm thick that do not crack upon bending and are more than 84% transparent to visible light. The compatibility of oxidative CVD deposition of PEDOT is demonstrated on silicon, glass, plastic, and paper substrates.

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As the complexity of microphotonic devices grows, the ability to precisely trim microring resonators becomes increasingly important. Photo-oxidation trimming uses UV irradiation to oxidize a cladding layer composed of polymerized hexamethyldisilane (6M2S) deposited with plasma-enhanced chemical vapor deposition (PECVD). PECVD 6M2S has optical properties that are compatible with microring devices, and its high cross linking renders it insoluble. Photo-oxidation decreases the refractive index of PECVD 6M2S by nearly 4%, permitting large resonance shifts that are not feasible with thermal trimming techniques. Resonance shifts from single-mode, 100 microm diameter Si3N4 (n =2.2) rings were as large as 12.8 nm for the TE mode and 23.5 nm for the TM mode.