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The aim of this work is to structurally characterize chitosan-zinc oxide nanoparticles (CS-ZnO NPs) films in a wide range of NPs concentration (0–20 wt.%). Dielectric, conductivity, mechanical, and piezoelectric properties are assessed by using thermogravimetry, FTIR, XRD, mechanical, and dielectric spectroscopy measurements. These analyses reveal that the dielectric constant, Young’s modulus, and piezoelectric constant (d33) exhibit a strong dependence on nanoparticle concentration such that maximum values of referred properties are obtained at 15 wt.% of ZnO NPs. The piezoelectric coefficient d33 in CS-ZnO nanocomposite films with 15 wt.% of NPs (d33 = 65.9 pC/N) is higher than most of polymer-ZnO nanocomposites because of the synergistic effect of piezoelectricity of NPs, elastic properties of CS, and optimum NPs concentration. A three-phase model is used to include the chitosan matrix, ZnO NPs, and interfacial layer with dielectric constant higher than that of neat chitosan and ZnO. This layer between nanoparticles and matrix is due to strong interactions between chitosan’s side groups with ZnO NPs. The understanding of nanoscale properties of CS-ZnO nanocomposites is important in the development of biocompatible sensors, actuators, nanogenerators for flexible electronics and biomedical applications.

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In this work, a high-resolution atomic force acoustic microscopy imaging technique is developed in order to obtain the local indentation modulus at the nanoscale level. The technique uses a model that gives a qualitative relationship between a set of contact resonance frequencies and the indentation modulus. It is based on white-noise excitation of the tip–sample interaction and uses system theory for the extraction of the resonance modes. During conventional scanning, for each pixel, the tip–sample interaction is excited with a white-noise signal. Then, a fast Fourier transform is applied to the deflection signal that comes from the photodiodes of the atomic force microscopy (AFM) equipment. This approach allows for the measurement of several vibrational modes in a single step with high frequency resolution, with less computational cost and at a faster speed than other similar techniques. This technique is referred to as stochastic atomic force acoustic microscopy (S-AFAM), and the frequency shifts of the free resonance frequencies of an AFM cantilever are used to determine the mechanical properties of a material. S-AFAM is implemented and compared with a conventional technique (resonance tracking-atomic force acoustic microscopy, RT-AFAM). A sample of a graphite film on a glass substrate is analyzed. S-AFAM can be implemented in any AFM system due to its reduced instrumentation requirements compared to conventional techniques.