A single optical component for a diode laser bar combines fast-axis smile and lens error correction with slow-axis collimation. Produced by laser-machining/polishing, it provides 0.9 mm focal length, 200 microm pitch slow-axis collimation on the same surface that corrects fast-axis errors. Custom fabrication enables fill-factor optimization for the 49 single-mode beams and gives parallel collimation with rms pointing errors of 3% and 6% of the far-field divergence for the fast- and slow-axis array respectively. Sub-micron pitch mismatch between the slow-axis lens and emitter arrays, and beam pointing changes by thermal expansion of the laser bar are detected.

Rapid Laser Patterning (RLP) of ITO on glass offers a cost effective alternative to wet-etch lithography in the manufacture of PDPs. It is demonstrated that RLP can effectively pattern ITO to industrial standards. It is also shown that the process is rapid and has major cost benefits vs. lithography. RLPWet etch Resist Coating Resist Exposure (UV) Resist Wet Etching ITO Wet Etch Resist Stripping Cleaning Laser Direct Write of ITO Rinsing SID 07 DIGEST • 1211

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Patterning the Black Matrix (BM) layer in an LCD typically employs wet‐etch lithography. This paper describes an alternative laser‐based patterning technique called Assist Liquid™. This technique meets rigorous customer targets and may offer a more cost effective solution for LCD manufacture.