We demonstrate an atomic layer deposition of TiO2 thin films on self-assembled monolayers of ω-functionalized alkanethiolates. The TiO2 thin films were grown on OH-terminated alkanethiolate monolayer-coated gold by atomic layer deposition at 100 °C. The atomic layer deposition of the TiO2 thin films is self-controlled and extremely linear relative to the number of cycles. Selective deposition of the TiO2 thin film using atomic layer deposition was accomplished with patterned self-assembled monolayers as templates. Microcontact printing was done to prepare the patterned monolayers of the alkanethiolates on gold substrates. The selective atomic layer deposition is based on the fact that the TiO2 thin film is selectively deposited only on the regions exposing OH-terminated alkanethiolate monolayers of the gold substrates, because the regions covered with CH3-terminated monolayers do not have any functional group to react with precursors.

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