Carbon nanotube films were patterned by an excimer laser projection photoablation process at low incident energy conditions. The carbon nanotubes were deposited on a quartz substrate and then a conventional photoresist was coated on it as a photoablation assistor. The photoresist and the carbon nanotubes were simultaneously patterned by the projection photoablation process, and then the photoresist was removed. It was possible to make clean patterns of carbon nanotubes even though the incident fluence on the carbon nanotubes was significantly lower than the threshold energy otherwise needed for their direct ablation.

Indium tin oxide ͑ITO͒, an important material used as a transparent conductive oxide in thin-film transistor liquid-crystal display fabrication, was patterned by a nonlithographic process. First, a Si 3 N 4 substrate coated with photoresist was patterned by a projection photoablation process using 248 nm wavelength KrF excimer laser radiation. ITO was then deposited by sputtering and patterned by lift-off. The resulting ITO pattern was clean even though it was patterned without the conventional steps of photoresist development and ITO etching. This process technology provides a faster and more economical patterning capability compared to conventional photolithography and etch processes used in the display industry.

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