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Stretchable interconnects are fabricated on polymer substrates using metal patterns both as functional interconnect layers and as in situ masks for excimer laser photoablation. Singlelayer and multilayer interconnects of various designs (rectilinear and "meandering") have been fabricated, and certain "meandering" interconnect designs can be stretched up to 50% uniaxially while maintaining good electrical conductivity and structural integrity. This approach eliminates masks and microfabrication processing steps as compared to traditional fabrication approaches. Furthermore, this technology is scalable for largearea sensor arrays and electronic circuits, adaptable for a variety of materials and interconnects designs, and compatible with MEMS-based capacitive sensor technology.

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Carbon nanotube films were patterned by an excimer laser projection photoablation process at low incident energy conditions. The carbon nanotubes were deposited on a quartz substrate and then a conventional photoresist was coated on it as a photoablation assistor. The photoresist and the carbon nanotubes were simultaneously patterned by the projection photoablation process, and then the photoresist was removed. It was possible to make clean patterns of carbon nanotubes even though the incident fluence on the carbon nanotubes was significantly lower than the threshold energy otherwise needed for their direct ablation.