Cu 2 ZnSnSe 4 (CZTSe) thin films are grown by coevaporation. Composition depth profiles reveal that a Zn rich phase is present at the CZTSe/Mo interface. Raman measurements on the as grown films are used to study the near surface region and the CZTSe/Mo interface, after mechanically removing the thin film from the Mo coated glass. These measurements provide direct experimental evidence of the formation of a ZnSe phase at the CZTSe/Mo interface. While the Raman spectra at the surface region are dominated by CZTSe modes, those measured at the CZTSe/Mo interface are dominated by ZnSe and MoSe2 modes.

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We investigate the symmetry of shallow acceptors in Cu chalcopyrites by polarization dependent photoluminescence measurements and density functional calculations. We determine the influence of the band symmetry versus the site symmetry. The polarization of the emitted or absorbed light is parallel to the c-axis in the case of CuGaSe2 and perpendicular to the c-axis in the case of CuInSe2. The symmetry of the defects depends in each case on the symmetry of the topmost band. Neither does the site symmetry affect the defect symmetry nor do the defects change the symmetry of the band.

There is increasing interest in growing epitaxial GaAs on Si substrates. Such a device structure would allow low-cost substrates to be used for high-efficiency cascade- junction solar cells. However, high-defect densities may result from the large lattice mismatch (∼4%) between the GaAs epilayer and the silicon substrate. These defects can act as nonradiative recombination centers that can degrade the optical and electrical properties of the epitaxially grown GaAs. For this reason, it is important to optimize epilayer growth conditions in order to minimize resulting dislocation densities. The purpose of this paper is to provide an indication of the quality of the epitaxially grown GaAs layers by using transmission electron microscopy (TEM) to examine dislocation type and density as a function of various growth conditions. In this study an intermediate Ge layer was used to avoid nucleation difficulties observed for GaAs growth directly on Si substrates. GaAs/Ge epilayers were grown by molecular beam epitaxy (MBE) on Si substrates in a manner similar to that described previously.