We describe the challenges of migrating the Cell Broadband Engine TM (Cell BE) [1-2] design from a 65nm SOI [3] to a 45nm twin-well CMOS technology on SOI with low-κ dielectric (κ = 2.4) and 10 copper metal layers [4]. The technology offers dual-gateoxide thicknesses of 1.16nm and 2.5nm for 1.0V and 1.5V nominal power supply, respectively. Thicker oxide devices are used in analog circuits. To guarantee the proper operation of existing gaming software, the exact cycle-by-cycle machine behavior, including operating frequency, must be preserved. We set the focus of design migration to four goals: 1) automated design migration where possible, 2) 30% power reduction, 3) 30% area reduction, and 4) design for manufacturability (DFM) improvement. With the design rules across technologies being relatively compatible, we take advantage of automated migration for the bulk of Cell BE circuit blocks. Circuits are manually fine tuned for timing, noise tolerance, and design robustness after the initial automatic migration. We take a different approach with memory and analog circuits. Analog circuits do not scale well due to the required area for decoupling capacitance. The I/O area, especially the area for C4 bumps, dictates chip dimensions since the same number of I/O signals is required and the C4 pitch does not scale from the previous technology.Since digital circuits occupy the bulk of chip area, it is crucial to migrate them effectively. The original digital circuits in 65nm consist of 3 types of components: parameterized cells, common leaf cells (flip-flop and local clock buffer), and custom cells. The migration of parameterized cells is done through software. A tool called Migration Assistant Shape Handler (MASH) [5] is applied to the common leaf cells first. MASH first shrinks the shapes according to the scale factor between technologies. Second, MASH corrects as many design rule violations in 45nm as possible with minimum layout perturbations and the remaining violations are repaired manually. The pin locations for these cells are fixed and scaled only in size. Metal blockage changes are minimized to reduce the effect on higher design levels. Hierarchical migration is performed in 2 phases. The first phase includes placing scaled leaf cells at scaled coordinates and scaling any remaining shapes. The second phase applies MASH to remove design rule violations. Using this design migration methodology, we shrink the chip size by 34% with respect to 65nm. Figure 4.3.1 shows dimensions of Cell BE and its major partitions in 3 technologies.We take advantage of the automated approach as much as possible by applying it to smaller memory array blocks and then tuning circuits manually. As the SRAM cell size (0.404mm 2 ) shrinks in 45nm from 65nm (0.7mm 2 ), we address the cell stability concern due to process variability [6] by using a separate array power supply (V CS ). Lowering the main power supply (V DD ) is critical for reducing the chip power consumption. However, we cannot lower V CS by the same amount as V DD due to SRAM...

Restrictive design rules (RDRs) have been introduced as a simplified layout optimization method to better enable resolution enhancement techniques in ultra-deep submicron designs [16]. In this paper, we study the technology migration problem for designs with strong RET-driven layout restrictions, i.e., RDR constraints, which require devices (gates) to be placed on a coarse pitch and in a single orientation. In particular, we study the legalization problem with on-pitch constraints for devices with an objective of minimum layout perturbation. The problem can be formulated as an integer linear programming (ILP) problem with a set of stringent integer constraints, and it can be approximated as a mixed integer linear programming (MILP) problem. Instead of using an MILP solver to solve it, we propose a two-stage method -first the target on-pitch positions for gates are computed and second the original problem is relaxed to a linear programming problem. Library cell layouts designed in a technology with conventional ground rules have been migrated successfully to a technology with RDRs using our approach.

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In this paper, we investigate routing restrictions that enable the generation of "correct by construction" layouts for Dark Field AltPSM. Existing routers produce designs in which coloring errors are numerous, and up to 15% of the pin locations in macros may cause unavoidable coloring errors. We identify routing restrictions which produce 100% phase-correct results, and quantify the impact on wire-lengths and via counts.

Two primary tracks of DfM, one originating from physical design characterization, the other from low-k1 lithography, are described. Examples of specific DfM efforts are given and potentially conflicting layout optimization goals are pointed out. The need for an integrated DfM solution than ties together currently parallel DfM efforts of increasing sophistication and layout impact is identified and a novel DfM-enabling design flow is introduced.