Lead iodide (PbI 2) is a semiconductor with extensive use as an active layer for X-ray detectors and as a precursor for perovskite solar cells. Here we present a low vacuum method to obtain very uniform PbI 2 films with full substrate coverage. This method consists in the sublimation of PbI 2 inside a hot zone and its transport by an Ar flow to a substrate held at a controlled temperature. Using scanning electron microscopy combined with focused ion beam and X-ray diffraction we studied the morphology and crystallographic structure of the PbI 2 films with different deposition parameters: substrate and source evaporation temperature, deposition time and substrate material. At high substrate temperature (80ºC) and low evaporation temperature (310ºC) onto a glass sample, we obtained dense and smooth PbI 2 films showing hexagonal crystals, or platelets, stacked parallel to the substrate. The choice of the substrate material has a significant impact on the film morphology yielding porous-like structures with voids within the films for some substrates. A bandgap E g = 2.42 eV and Urbach energy
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