The diameter of particles which adversely affects the yield has been shrinking as ULSI devices are more and more miniaturized. Ultrafine particles with diameters of 0.1 ~m or less have become important recently. Ultrafine particles of this type are expected to be difficult to remove. This study has established a method to evaluate ultrafine particle removal efficiency. Ultrafine metallic particles with diameters of several to several hundreds of nanometers were deposited on the Si surface using a gas deposition method. The removal efficiency of the ultrafine particles using various cleaning solutions was investigated. APM (NH4OH-H202-H20) cleaning can remove 150 nm Au particles, but cannot remove ultrafine Au particles with a diameter less than several tens of nanometers. In addition, the Si surface becomes rougher when a DHF-H20~ cleaning is performed to remove Au ultrafine particles. This is believed to be because noble metals such as Au, Ag, and Cu, which feature a higher electronegativity than St, attract electrons from Si facilitating Si oxidation.
A novel inkjet technique for forming bus and address electrodes has been developed. Silver nano‐particles dispersed into organic solvent were employed as a special ink for inkjet printing. Bus electrodes of 50‐μm‐width and 2‐μm‐thickness have been inkjet printed using the nano‐particle ink. The resistivity of the bus electrodes was 2 μΩcm after baking at 300°C for 30 minutes. We have fabricated a PDP test panel using inkjet bus electrodes to study its feasibility.
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