Since a few years, indium nitride promising properties for device applications have attracted much attention worldwide. Huge efforts are dedicated to optimize indium nitride growth. However, this growth is extremely challenging, in particular using the metal organic vapor phase epitaxy (MOVPE) technique which exhibits very low growth rates. This may explain why most of the samples available in the scientific community, which also present the best electrical properties, were grown by molecular beam epitaxy (MBE). However, up to date, no intrinsic indium nitride layer was obtained. InN epilayer crystalline quality suffers from the lack of lattice matched substrates, leading to the use of double‐step growth process. In this paper, we show that InN low lateral growth rate is a limiting parameter for efficient double‐step growth process. But, we also report that the use of CBrCl3 during InN growth enhances the lateral growth rate. To improve the growth rate along the c‐axis, we investigate alternative precursors for both nitrogen and indium species. We show that ammonia remains the best precursor, but combined with triethylindium, the growth rate increases with optimum crystalline quality. Finally, we compare MOVPE‐grown and MBE‐grown InN layers in order to understand the difference observed on the electrical properties. We show how thermal annealing can improve the MOVPE‐grown InN layers leading to similar electrical properties than reported in MBE‐grown samples. The role of ammonia as source of hydrogen is also discussed.

InSe is a promising material in many aspects where the role of excitons is decisive. Here we report the sequential appearance in its luminescence of the exciton, the biexciton, and the P-band of the exciton-exciton scattering while the excitation power increases. The strict energy and momentum conservation rules of the P-band are used to reexamine the exciton binding energy. The new value ≥20 meV is markedly higher than the currently accepted one (14 meV), being however well consistent with the robustness of the excitons up to room temperature. A peak controlled by the Sommerfeld factor is found near the bandgap (~1.36 eV). Our findings supported by theoretical calculations taking into account the anisotropic material parameters question the pure three-dimensional character of the exciton in InSe, assumed up to now. The refined character and parameters of the exciton are of paramount importance for the successful application of InSe in nanophotonics.

We extend to any temperature, the sophisticated calculation of the evolution of the 2 K photoluminescence energy of InN proposed by Arnaudov et al. [Phys. Rev. B 69, 115216 (2004)], in view of determining the residual doping of thin films. From the detailed line shape modeling, we extract the full width at half maximum of the photoluminescence line which, in the first order, varies like n0.51 at low temperature. This allows us to propose a handy tool for rapid residual doping evaluation. Last, temperature and inhomogeneous broadening effects are analyzed. Ignoring the latter is shown to lead to an overestimation of the residual doping.