The sharp increase in the leakage part of the total power of the very large scale integration (VLSI) circuits is a significant concern in the deep submicron CMOS process. The NOT gates, Gate Diffusion Input (GDI) cells, restorer NMOS-PMOS transistors for full-swing operation, and any path from the power voltage to the ground are the main sources of leakage power dissipation as well as short-circuit in the VLSI CMOS circuits/chips. The input controlled leakage restrainer transistor (ICLRT) is a new circuit-level method that is proposed in this paper. The ICLRTs can be deliberately added to any VLSI CMOS circuit to largely diminish the total power dissipation especially by the reduction of its leakage and short-circuit parts. The full adders are vital parts in various VLSI circuits/systems, especially in circuits used for fulfilling arithmetic operations. Those are often placed in the critical paths for multiplication and division, so influence the throughout the efficiency of the system. To test the proposed technique, ICLRTs added to five best 1-bit hybrid full adders in the deep submicron process to fit the needs of the day. The efficiency of the proposed method is evaluated using SPICE simulations in 22-nm CMOS BSIM4 process. Evaluation outcomes with 1-V power supply verified that the power dissipation and power-delay product (PDP) of the hybrid full adders based on ICLRT technique relative to corresponding original designs are reduced 65.67-95.7% and 35.85-87.37%, respectively. Mismatch analysis and Monte Carlo simulations prove the robustness and stability of the presented circuits in the presence of the process, voltage, and temperature (PVT) variations.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.