The ability to achieve near-unity light-extraction efficiency is necessary for a truly deterministic single-photon source. The most promising method to reach such high efficiencies is based on embedding single-photon emitters in tapered photonic waveguides defined by top-down etching techniques. However, light-extraction efficiencies in current top-down approaches are limited by fabrication imperfections and etching-induced defects. The efficiency is further tempered by randomly positioned off-axis quantum emitters. Here we present perfectly positioned single quantum dots on the axis of a tailored nanowire waveguide using bottom-up growth. In comparison to quantum dots in nanowires without waveguides, we demonstrate a 24-fold enhancement in the single-photon flux, corresponding to a light-extraction efficiency of 42%. Such high efficiencies in one-dimensional nanowires are promising to transfer quantum information over large distances between remote stationary qubits using flying qubits within the same nanowire p–n junction.
High aspect ratios are highly desired to fully exploit the one-dimensional properties of indium antimonide nanowires.Here we systematically investigate the growth mechanisms and find parameters leading to long and thin nanowires. Variation of the V/III ratio and the nanowire density are found to have the same influence on the "local" growth conditions and can control the InSb shape from thin nanowires to nanocubes. We propose that the V/III ratio controls the droplet composition and the radial growth rate and these parameters determine the nanowire shape. A sweet spot is found for nanowire interdistances around 500 nm leading to aspect ratios up to 35. High electron mobilities up to 3.5 × 10 4 cm 2 V −1 s −1 enable the realization of complex spintronic and topological devices.
Structure engineering is an emerging tool to control opto-electronic properties of semiconductors. Recently, control of crystal structure and the formation of a twinning superlattice have been shown for III-V nanowires. This level of control has not been obtained for Si nanowires, the most relevant material for the semiconductor industry. Here, we present an approach, in which a designed twinning superlattice with the zinc blende crystal structure or the wurtzite crystal structure is transferred from a gallium phosphide core wire to an epitaxially grown silicon shell. These materials have a difference in lattice constants of only 0.4%, which allows for structure transfer without introducing extra defects. The twinning superlattices, periodicity, and shell thickness can be tuned with great precision. Arrays of free-standing Si nanotubes are obtained by a selective wet-chemical etch of the core wire.
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