Self-powered photodetectors
operating in the UV–visible–NIR
window made of environmentally friendly, earth abundant, and cheap
materials are appealing systems to exploit natural solar radiation
without external power sources. In this study, we propose a new p–n
junction nanostructure, based on a ZnO–Co3O4 core–shell nanowire (NW) system, with a suitable electronic
band structure and improved light absorption, charge transport, and
charge collection, to build an efficient UV–visible–NIR
p–n heterojunction photodetector. Ultrathin Co3O4 films (in the range 1–15 nm) were sputter-deposited
on hydrothermally grown ZnO NW arrays. The effect of a thin layer
of the Al2O3 buffer layer between ZnO and Co3O4 was investigated, which may inhibit charge recombination,
boosting device performance. The photoresponse of the ZnO–Al2O3–Co3O4 system at
zero bias is 6 times higher compared to that of ZnO–Co3O4. The responsivity (R) and specific
detectivity (D*) of the best device were 21.80 mA
W–1 and 4.12 × 1012 Jones, respectively.
These results suggest a novel p–n junction structure to develop
all-oxide UV–vis photodetectors based on stable, nontoxic,
low-cost materials.
In this work, we present all-oxide p-n junction core-shell nanowires (NWs) as fast and stable self-powered photodetectors. Hydrothermally grown n-type ZnO NWs were conformal covered by different thicknesses (up to 420 nm) of p-type copper oxide layers through metalorganic chemical vapor deposition (MOCVD).The ZnO NWs exhibit a single crystalline Wurtzite structure, preferentially grown along the [002] direction, and energy gap Eg=3.24 eV. Depending on the deposition temperature, the copper oxide shell exhibits either a crystalline cubic structure of pure Cu2O phase (MOCVD at 250 C) or a cubic structure of Cu2O with the presence of CuO phase impurities (MOCVD at 300 C), with energy gap of 2.48 eV.The electrical measurements indicate the formation of a p-n junction after the deposition of the copper oxide layer. The core-shell photodetectors present a photoresponsivity at 0V bias voltage up to 7.7 µA/W and time response ≤0.09 s, the fastest ever reported for oxide photodetectors in the visible range, and among the fastest including photodetectors with response limited to the UV region. The bare ZnO NWs have slow photoresponsivity, without recovery after the end of photo-stimulation. The fast time response for the core-shell structures is due to the presence of the p-n junctions, which enables fast exciton separation and charge extraction. Additionally, the suitable electronic structure of the ZnO-Cu2O heterojunction enables self-powering of the device at 0V bias voltage. These results represent a significant advancement in the development of low-cost, high efficiency and self-powered photodetectors, highlighting the need of fine tuning the morphology, composition and electronic properties of p-n junctions to maximize device performances.
Development
of high-entropy alloy (HEA) films is a promising and cost-effective
way to incorporate these materials of superior properties in harsh
environments. In this work, a refractory high-entropy alloy (RHEA)
film of equimolar CuMoTaWV was deposited on silicon and 304 stainless-steel
substrates using DC-magnetron sputtering. A sputtering target was
developed by partial sintering of an equimolar powder mixture of Cu,
Mo, Ta, W, and V using spark plasma sintering. The target was used
to sputter a nanocrystalline RHEA film with a thickness of ∼900
nm and an average grain size of 18 nm. X-ray diffraction of the film
revealed a body-centered cubic solid solution with preferred orientation
in the (110) directional plane. The nanocrystalline nature of the
RHEA film resulted in a hardness of 19 ± 2.3 GPa and an elastic
modulus of 259 ± 19.2 GPa. A high compressive strength of 10
± 0.8 GPa was obtained in nanopillar compression due to solid
solution hardening and grain boundary strengthening. The adhesion
between the RHEA film and 304 stainless-steel substrates was increased
on annealing. For the wear test against the E52100 alloy steel (Grade
25, 700–880 HV) at 1 N load, the RHEA film showed an average
coefficient of friction (COF) and wear rate of 0.25 (RT) and 1.5 (300
°C), and 6.4 × 10–6 mm3/N m
(RT) and 2.5 × 10–5 mm3/N m (300
°C), respectively. The COF was found to be 2 times lower at RT
and wear rate 102 times lower at RT and 300 °C than
those of 304 stainless steel. This study may lead to the processing
of high-entropy alloy films for large-scale industrial applications.
Characterizing carrier redistribution due to optical field modulation in a plasmonic hot-electron/semiconductor junction can raise the framework for harnessing the carrier decay of plasmonic metals in more efficient conversion systems....
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