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Articles you may be interested inThe use of optical microscopy to examine crystallite nucleation and growth in thermally annealed plasma enhanced chemical vapor deposition and hot wire chemical vapor deposition a-Si:H films Evidence of electron-emission-enhanced nucleation of diamonds in microwave plasma-enhanced chemical vapor deposition Appl.Particle generation and thin film surface morphology in the tetraethylorthosilicate/oxygen plasma enhanced chemical vapor deposition process

A growth of high quality thick diamond film has been carried out on high pressure and high temperature diamond substrate by microwave plasma chemical vapor deposition system. First, the effect of growth parameters on the growth film morphologies was investigated, indicating that the diamond film is very sensitive to the growth temperature and input microwave power. Then, sample holders with different geometries were used in our experiment, illustrating that high quality diamond film can be grown by using the sample holder with flat surface. Finally, the characterization of the as grown samples has been carried out.