Mold releasing forces are experimentally measured in various exposure dosages for UV nanoimprint resist. PAK01 resist is examined to evaluate the chemical conversion by FTIR. Time dependent conversion ratio is measured under UV exposure and the conversion ratio of the UV resin versus exposed dosages is verified. Also, releasing forces for various exposure dosages are mechanically measured for flat mold. The results show the measured releasing force is not stabilized until the conversion is completed up to over around 90 %. Based on these results, the minimums exposure dosage is known for successful releasing.

No abstract

The impact of exposure doses on the demolding process in UV nanoimprint lithography ͑UV NIL͒ was studied. The PAK-01 resist was examined to investigate the dependence of the conversion ratio and elastic modulus on the adhesion force between the mold and the resist for various UV dosages. Also, adhesion forces between the resist and SiO 2 / Si mold were measured in various dosages. The results show that the adhesion force is unstable until the elastic modulus of the resist is enlarged enough even if the chemical conversion is completed by UV exposure. On the other hand, the demolding in the actual UV NIL experiment is not successful at lower dosages. Based on these evaluations, a suitable exposure dosage is suggested for successful demolding to realize a high throughput UV NIL process without demolding defects.