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We demonstrate a process to vary the gate-length of vertical MOSFETs on the same sample with high accuracy and high performance. Fabricated vertical InAs/InGaAs MOSFETs on Si have gate length ranging from 25 nm to 140 nm. The results shown are from single nanowire transistors as well as arrays with nanowires ranging from 80 to 500 nanowires. The devices show good yield and clear scaling trends. We demonstrate a device with gm = 2.4 mS/µm and a device with Ion = 407 µA/µm at Ioff = 100 nA/µm and VDD = 0.5 V, which both are record values for vertical MOSFETs. This is the first demonstration of vertical MOSFETs having gatelengths comparable to the state-of-the-art lateral III-V MOSFETs.

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