Scatterometry is a well established technique currently utilized in research, as well as in industrial applications, to retrieve the properties of a given scatterer (the target) by looking at how the light coming from a certain source is diffracted in the far field. Currently the light source is often a discharge lamp that, after wavelength filtering, can be thought as a quasi-monochromatic, but spatially incoherent, source. In the present work, benefits of using a focused spot from a spatially coherent light source, as that emitted by a laser, are investigated on a theoretical viewpoint. The focused spot is scanned over the object of interest and, for each scan position, a far-field diffraction pattern is recorded. Our results show that spatially coherent light can sensibly increase the accuracy of the technique with respect to the target's geometrical profile.
Abstract:Optical scatterometry is the state of art optical inspection technique for quality control in lithographic process. As such, any boost in its performance carries very relevant potential in semiconductor industry. Recently we have shown that coherent Fourier scatterometry (CFS) can lead to a notably improved sensitivity in the reconstruction of the geometry of printed gratings. In this work, we report on implementation of a CFS instrument, which confirms the predicted performances. The system, although currently operating at a relatively low numerical aperture (NA = 0.4) and long wavelength (633 nm) allows already the reconstruction of the grating parameters with nanometer accuracy, which is comparable to that of AFM and SEM measurements on the same sample, used as reference measurements. Additionally, 1 nm accuracy in lateral positioning has been demonstrated, corresponding to 0.08% of the pitch of the grating used in the actual experiment.
We introduce the degree of paraxiality as a paraxiality measure of a monochromatic light beam. Computation of this parameter is possible once the plane-wave spectrum of the field being analyzed is given for a starting source plane. On the basis of this definition, quantitative comparisons of the paraxiality of different types of fields are possible. In addition, the recently introduced paraxial estimator [Opt. Lett.32, 927 (2007)] is identified as the limiting case of the degree of paraxiality.
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