The utility of Raman spectroscopy for the simultaneous determination of composition and strain in thin GexSi1−x layers has been investigated. Using data from the literature and new data for the strain shift of the Si-Si phonon mode presented here, we show how Raman spectra provide several different means of measuring composition and strain in samples as thin as 200 Å. We demonstrate that for largely relaxed layers with compositions near x=0.30, Raman scattering can measure the composition, x, with an accuracy of ±0.015 and the strain, ε, with an accuracy ±0.0025. The accuracy of the alloy composition obtained from Raman spectra is comparable or, in the case of very thin layers, superior to that measured by other techniques such as x-ray diffraction, electron microprobe, and Auger electron spectroscopy.

Silicon has many attractive properties for quantum computing, and the quantum dot architecture is appealing because of its controllability and scalability. However, the multiple valleys in the silicon conduction band are potentially a serious source of decoherence for spin-based quantum dot qubits. Only when these valleys are split by a large energy does one obtain well-defined and long-lived spin states appropriate for quantum computing. Here we show that the small valley splittings observed in previous experiments on Si/SiGe heterostructures result from atomic steps at the quantum well interface. Lateral confinement in a quantum point contact limits the electron wavefunctions to several steps, and enhances the valley splitting substantially, up to 1.5 meV. The combination of electronic and magnetic confinement produces a valley splitting larger than the spin splitting, which is controllable over a wide range. These results improve the outlook for realizing spin qubits with long coherence times in silicon-based devices.The fundamental unit of quantum information is the qubit. Qubits can be constructed from the quantum states of physical objects like atomic ions [1], quantum dots [2,3,4,5,6,7] or superconducting Josephson junctions [8]. A key requirement is that these quantum states should be well-defined and isolated from their environment. An assemblage of many qubits into a register and the construction of a universal set of operations, including initialization, measurement, and single and multi-qubit gates, would enable a quantum computer to execute algorithms for certain difficult computational problems like prime factorization and database search far faster than any conventional computer [9].The solid state affords special benefits and challenges for qubit operation and quantum computation. State-ofthe-art fabrication techniques enable the positioning of electrostatic gates with a resolution of several nanometers, paving the way for large scale implementations. On the other hand, the solid state environment provides numerous pathways for decoherence to degrade the computation [10]. Spins in silicon offer a special resilience against decoherence because of two desirable materials properties [11,12]: a small spin-orbit coupling and predominately spin-zero nuclei. Isotopic purification could essentially eliminate all nuclear decoherence mechanisms.Silicon, however, also has a property that potentially can increase decoherence. Silicon has multiple conduction band minima or valleys at the same energy. Unless this degeneracy is lifted, coherence and qubit operation will be threatened. In strained silicon quantum wells there are two such degenerate valleys [13] whose quantum numbers and energy scales compete directly with the spin degrees of freedom. In principle, sharp confinement potentials, like the quantum well interfaces, couple these two valleys and lift the degeneracy, providing a unique ground state if the coupling is strong enough [14,15]. Theoretical analyses for noninteracting electrons in perfectly f...

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▪ Abstract  We review recent advances in our understanding of the epitaxial growth and properties of SiGe/Si heterostructures for applications in high-speed field-effect transistors. Improvements in computing power and experimental methods have led to new calculations and experiments that reveal the complexity of 60° misfit dislocations and their interactions, which ultimately determine the characteristics of strain-relaxed SiGe films serving as a buffer layer for strained-layer devices. Novel measurements of the microstructure of relaxed SiGe films are discussed. We also present recent work on the epitaxial growth of SiGe/Si heterostructures by ultra-high-vacuum chemical vapor deposition. This growth method not only provides device quality buffer layers, but abrupt, high-concentration phosphorous-doping profiles, and high-mobility S0.20Ge0.80/Ge composite hole channels have also been grown. These achievements enabled the fabrication of outstanding n- and p-channel modulation-doped field-effect transistors that show enormous promise for a variety of applications.