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An active hyperspectral sensor (AHS) was developed for target detection and classification applications. AHS measures light scattered from a target, illuminated by a broadband near-infrared supercontinuum (SC) light source. Spectral discrimination is based on a voltage-tunable MEMS Fabry-Pérot Interferometer (FPI). The broadband light is filtered by the FPI prior to transmitting, allowing for a high spectral-power density within the eye-safety limits. The approach also allows for a cost-efficient correction of the SC instability, employing a non-dispersive reference detector. A precision of 0.1% and long-term stability better than 0.5% were demonstrated in laboratory tests. The prototype was mounted on a car for field measurements. Several road types and objects were distinguished based on the spectral response of the sensor targeted in front of the car.

Analysis methods and instrumentation for obtaining optical parameters and thickness profiles of thin-film samples from spectrophotometric and ellipsometric measurements are presented. Measured samples include thermally grown and evaporated SiO2 on a silicon substrate and a polymer photoresist layer on silicon. Experimental results at multiple sample positions give the thickness uniformity and optical constants of thin films. The thickness results obtained with spectrophotometry and ellipsometry agree within 1 nm for the 300 nm thick layer of SiO2 on silicon. For the 1600 nm thick resist sample the agreement of the measurement methods is within 8 nm. For the sample with a nominally 6000 nm thick layer of SiO2 on silicon, there is a deviation of ∼100 nm between the spectrophotometry and ellipsometry results. As an application, the optical parameters of a SiO2 layer on an induced junction silicon photodiode are determined by spectrophotometry and are used to confirm earlier values and uncertainties of the SiO2 refractive index and layer thickness non-uniformity.

The European Metrology Research Program (EMRP) is a metrology-focused program of coordinated Research & Development (R&D) funded by the European Commission and participating countries within the European Association of National Metrology Institutes (EURAMET). It supports and ensures research collaboration between them by launching and managing different types of project calls. Within the EMRP Call 2012 "Metrology for Industry", the joint research project (JRP) entitled "Multidimensional Reflectometry for Industry" (xD-Reflect) was submitted by a consortium of 8 National Metrology Institutes (NMIs) and 2 universities and was subsequently funded. The general objective of xD-Reflect is to meet the demands from industry to describe the overall macroscopic appearance of modern surfaces by developing and improving methods for optical measurements which correlate with the visual sensation being evoked. In particular, the project deals with the "Goniochromatism", "Gloss" and "Fluorescence" properties of dedicated artifacts, which will be investigated in three main work packages (WP). Two additional transversal WP reinforce the structure: "Modelling and Data Analysis" with the objective to give an irreducible set of calibration schemes and handling methods and "Visual Perception", which will produce perception scales for the different visual attributes. Multidimensional reflectometry involves the enhancement of spectral and spatial resolution of reference gonioreflectometers for BRDF measurements using modern detectors, conoscopic optical designs, CCD cameras, line scan cameras, and modern light sources in order to describe new effects like sparkle and graininess/coarseness. More information and updated news concerning the project can be found on the xD-Reflect website http://www.xdreflect.eu/.