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In this work the investigations of the morphology, structure and chemical composition of nanocrystalline SnS films grown by hot wall deposition method on glass substrates before and after high-density low-pressure inductively coupled argon plasma sputtering were performed using scanning electron microscopy, x-ray diffraction analysis, Raman spectroscopy, and energy-dispersive x-ray spectroscopy. The phenomenon of the surface smoothing for the SnS films with petal-like nanocrystallites during plasma treatment is described and the low sputtering rate for the studied films is discussed.

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