This article presents the results of the study of the influence of the most significant parameters of the side wall roughness of an ultra-thin silicon nitride lightguide layer of multimode integrated optical waveguides with widths of 3 and 8 microns. The choice of the waveguide width was made due to the need to provide multimode operation for telecommunication wavelengths, which is necessary to ensure high integration density. Scattering in waveguide structures was measured by optical frequency domain reflectometry (OFDR) of a backscattering reflectometer. The finite difference time domain method (FDTD) was used to study the effect of roughness parameters on optical losses in fabricated waveguides, the roughness parameters that most strongly affect optical scattering were determined, and methods of its significant reduction were specified. The prospects for implementing such structures on a quartz substrate are justified.

This article presents the results of a computer simulation of whispering gallery modes in the structure of a silicon disk resonator with a wedge-shaped profile made on a silicon-on-isolator base (SOI). The rationale for the choice of silicon as a material for its manufacturing is given. The results of the study of the influence of the wedge angle on the whispering gallery mode parameters (WGM) are presented. The optimum wedge angle of a silicon disk resonator is determined, which ensures the minimum loss and maximum mode stability. The technological aspects of plasma-chemical etching processes for forming a wedge-shaped profile of the edge of a silicon disk resonator are studied.

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