This brief presents an energy-efficient level shifter (LS) able to convert extremely low level input voltages to the nominal voltage domain. To obtain low static power consumption, the proposed architecture is based on the single-stage differential-cascode-voltage-switch scheme. Moreover, it exploits self-adapting pull-up networks to increase the switching speed and to reduce the dynamic energy consumption, while a split input inverting buffer is used as the output stage to further improve energy efficiency. When implemented in a commercial 180-nm CMOS process, the proposed design can up-convert from the deep subthreshold regime (sub-100 mV) to the nominal supply voltage (1.8 V). For the target voltage level conversion from 0.4 to 1.8 V, our LS exhibits an average propagation delay of 31.7 ns, an average static power of less than 60 pW, and an energy per transition of 173 fJ, as experimentally measured across the test chips

A high-performance temperature sensor based on coupled 4H-SiC Schottky diodes is presented. The linear dependence on temperature of the difference between the forward voltages appearing on two diodes biased at different constant currents, in a range from 30°C up to 300°C, was used for temperature sensing. A high sensitivity of 5.11 mV/°C was measured. This is, to the best of our knowledge, the first experimental result about a proportional-to-absolute-temperature sensor made with SiC diodes, showing both a good degree of linearity and long-term stability performance.Index Terms-Schottky diodes, silicon carbide, temperature sensors, wide band gap semiconductors.

We report on the fabrication and characterization of a metal-semiconductor-metal photodetector operating at 1550 nm and integrated into a silicon-on-insulator waveguide. Detection uses internal photoemissions through a metal/Si interface. In particular, a small metal/Si contact layer directly deposited on the vertical output facet of the waveguide absorbs the incoming radiation confined into a rib waveguide. The device parameters for responsivity, dark current, and bandwidth take values 3.5 mA, 3.5 nA, and 1 GHz, respectively. The results obtained indicate device suitability in power monitoring and telecommunications applications.

Electro optical absorption in hydrogenated amorphous silicon (proportional-Si:H)--morphous silicon carbonitride (proportional-SiCxNy) multilayers have been studied in two different planar multistacks waveguides. The waveguides were realized by plasma enhanced chemical vapour deposition (PECVD), a technology compatible with the standard microelectronic processes. Light absorption is induced at lambda = 1.55 microm through the application of an electric field which induces free carrier accumulation across the multiple insulator/semiconductor device structure. The experimental performances have been compared to those obtained through calculations using combined two-dimensional (2-D) optical and electrical simulations.

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