Extensive optimization on the fabrication of Mo/Si multilayer systems is canied out at the FOM InstituteRijnhuizen using e-beam evaporation. The process is being optimized including parameters such as variation of the mirror's centre wavelength, the metal fraction, deposition parameters, and the layer composition. Reflectivities of 69.5 % are demonstrated at normal incidence, with values of 67 to 69% being routinely achieved, demonstrating the capabilities of the deposition process. Some evidence of smoothening to interface roughness values lower than the roughness of the initial substrate is given. Furthermore, investigation of the temporal behaviour of the coatings does not indicate any loss of reflectivity over an eight-month period. An analysis of the multilayer composition and the interface roughness is given. The reflectivity measurements have been carried out at the PTB facilities at the electron storage rings BESSY I and BESSY II in Berlin. The results of measurements at both facilities are found to be identical and accuracy is discussed in detail.

The feasibility of a transmission x-ray microscope operating in the 3-7 keV photon energy range using phase zone plates (ZPs) has been tested. It has been demonstrated that, at a photon energy of 4 keV, structures smaller than 150 nm can be resolved with good contrast using exposure times in the second to minute range. A large diameter gold ZP was used as condenser and a tungsten ZP with an outermost zone width of 128 nm was used as a high spatial resolution imaging objective lens. Images with a field size of 10×10 μm2 were acquired using a charge coupled device camera optically coupled to a phosphor screen. The corresponding pixel size in the object plane was 70 nm.

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