As a typical process intensified strategy, tandem reaction driven by multifunctional catalyst is a paragon of the green catalytic process. Two or more active sites are usually required and their...

Ni@NiO@graphite nanoparticles with excellent OER performance were synthesized by a one-step chemical vapor deposition process.

Strong electromagnetic wave reflection loss concomitant with second emission pollution limits the wide applications of electromagnetic interference (EMI) shielding textiles. Decoration of textiles by using various dielectric materials has been found efficient for the development of highly efficient EMI shielding textiles, but it is still a challenge to obtain EMI shielding composites with thin thickness. A route of interfacial engineering may offer a twist to overcome these obstacles. Here, we fabricated a Ni nanoparticle/SiC nanowhisker/carbon cloth nanoheterostructure, where SiC nanowhiskers were deposited by a simple manufacturing method, namely, laser chemical vapor deposition (LCVD), directly grown on carbon cloth. Through directly constructing a Ni/SiC interface, we find that the formation of Schottky contact can influence the interfacial polarization associated with the generation of dipole electric fields, leading to an enhancement of dielectric loss. A striking feature of this interfacial engineering strategy is able to enhance the absorption of the incident electromagnetic wave while suppressing the reflection. As a result, our Ni/SiC/carbon cloth exhibits an excellent EMI shielding effectiveness of 68.6 dB with a thickness of only 0.39 mm, as well as high flexibility and long-term duration stability benefited from the outstanding mechanical properties of SiC nanowiskers, showing potential for EMI shielding applications.

SiC epitaxial wafers offer enormous potential for a wide range of telecom technologies due to their excellent properties. The experimental process was simulated by software, and the contour of gas flow velocity and raw material mass fraction inside the chamber were obtained. SiC films were epitaxially grown on 4H-SiC single crystalline substrates at different temperatures for one batch, using SiCl4, CH4, and H2 as precursors. With increasing temperature, the crystal phase changed from 4H-SiC at 1773 K to a mixture of 4H- and 3C-SiC, and then a mixture of 3C-SiC and graphite at higher than 1923 K. The film was mainly (004)-oriented 4H-SiC and (111)-oriented 3C-SiC.

In this study, HfO2 films were grown using a highly efficient HT-LCVD process with a large gradient (100 K mm−1) temperature field, achieving four novel microstructures which appeared simultaneously on a high-throughput sample.