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The statistical variations in electrical parameters, such as transistor gain factors and interconnect resistances, due to variations in the manufacturing process are studied using data obtained f r om a 0.8 m CMOS process. The impact of these variations and correlations on circuit operation is illustrated. Examples show that circuit delay can increase from the mean by about 100 due to crosstalk e ects aggravated b y p r ocess variations. Case studies emphasize the need for a tighter coupling between fabrication and circuit design and the need for new design corners based o n p r ocess information.

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