Highly dispersed titanium oxide photocatalysts anchored onto transparent plates of porous silica glass were successfully prepared by metal ion implantation, and their photocatalytic reactivity for the liquid-phase photocatalytic degradation of an aqueous 2-propanol solution was compared with that in an aqueous TiO2 dispersion. The titanium ions implanted into the porous silica glass are found to be present on the surface layer as isolated tetrahedral titanium oxide moieties by diffuse reflectance absorption, SIMS, XPS, and XAFS analyses. The specific photocatalytic reactivity of the anchored catalyst was much higher than that for TiO2 powder, which may be attributed to the tetrahedrally coordinated titanium oxide moieties. Metal ion implantation is one of the novel and useful techniques to prepare highly efficient photocatalysts on glass plates.

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Abstract— High‐performance top‐gate thin‐film transistors (TFTs) with a transparent zinc oxide (ZnO) channel have been developed. ZnO thin films used as active channels were deposited by rf magnetron sputtering. The electrical properties and thermal stability of the ZnO films are controlled by the deposition conditions. A gate insulator made of silicon nitride (SiNx) was deposited on the ZnO films by conventional P‐CVD. A novel ZnO‐TFT process based on photolithography is proposed for AMLCDs. AMLCDs having an aperture ratio and pixel density comparable to those of a‐Si:H TFT‐LCDs are driven by ZnO TFTs using the same driving scheme of conventional AMLCDs.

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