No abstract

No abstract

A novel liquid thermal polymerization resist was prepared for nanoimprint lithography on flexible plastic substrates. The resist is a mixture of poly(methyl methacrylate) (PMMA), methylmethacrylate (MMA), n-butylacrylate (n-BA), methacrylic acid (MAA) and 2,2′-azobisisobutyronitrile (AIBN). The resist can be imprinted at room temperature with a pressure of 1.2 MPa, and then cured at 95 °C to obtain nano-scaled and micro-scaled patterns. Replications of high-density line and space patterns with resolutions of 50 and 100 nm were obtained on a flexible ITO/PET substrate. The liquid resist has low viscosity, and shows a near-zero residual layer at the bottom of the pattern. Due to the addition of PMMA as the binder, the shrinkage of the resist after curing is only 2.01%.

Toxic epidermal necrolysis (TEN) is a rare but life-threatening skin disease that is most commonly drug-induced. It has recently been suggested that Stevens-Johnson syndrome (SJS) belongs to the same group of skin disorders, although it has a lower mortality rate than TEN. We report the case of a 26-year-old male schizophrenic patient with a history of carbamazepine-induced SJS 5 years earlier. At the time of his current admission, he was admitted to our psychiatry department with acute agitation due to schizophrenia. However, the patient and his family denied history of drug allergy. After 3 days of carbamazepine treatment, the patient developed TEN (body surface area > 90%). He was transferred to the burn center, but despite appropriate treatment, including intravenous hydrocortisone 200 mg q6h and being covered with sterile biological material, he died. It is important to note that re-administration of a drug that previously caused SJS may lead to TEN, which has a very high mortality rate.

No abstract