Composition in amorphous Si1−xCx:H heteroepitaxial thin films on Si (100) by plasma enhanced chemical vapour deposition (PECVD) is analysed. The unknown x (0.45-0.57) and the depth profile of hydrogen in the thin films are characterized by Rutherford backscattering spectrum (RBS), resonance-nuclear reaction analysis (R-NRA) and elastic recoil detection (ERD), respectively. In addition, the depth profile of hydrogen in the unannealed thin films is compared to that of the annealed thin films with rapid thermal annealing (RTA) or laser spike annealing (LSA) in nitrogen atmosphere. The results indicate that the stoichiometric amorphous SiC can be produced by PECVD when the ratio of CH4/SiH4 is approximately equal to 25. The content of hydrogen decreases suddenly from 35% to 1% after 1150 • C annealing. RTA can reduce hydrogen in SiC films effectively than LSA.

The samples of InGaN/GaN multiple quantum wells (MQWs) have been grown on (0001) sapphire substrate with n-GaN buffer layer by metal-organic chemical vapor deposition (MOCVD). According to the results of Rutherford backscattering (RBS)/channeling along 〈0001〉 axis, the conventional θ—2θ scans normal to GaN (0004) and (1014) plane at 0° and 180° azimuth angles and the photoluminescence (PL) properties at room temperature, we concluded that In atoms in the InGaN/GaN MQWs are highly substituted, with the substitution rate over 99%, and the average crystal lattice constants of InGaN/GaN MQWs were calculated accurately (aepi=0.3195nm，cepi=0.5198nm), which are almost equal to theoretical data. Using HRXRD and RBS,the atomic content of In was determined to be respectively 0.023 and 0.026, the result was consistent with actual growth conditions of InGaN/GaN MQWs. However,there was a great difference compared with In chemical composition obtained by PL properties, which shows that PL properties are not suitable for measuring the In chemical composition in InGaN/GaN MQWs.

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Hexagonal GaN epilayers with different AlxGa1-xN and AlN buffer layers were grown on Si(111) by metal-organic vapor phase epitaxy (MOVPE). Under the same growth conditions, the sample with four AlxGa1-xN buffer layers and one AlN buffer layer were grown on Si(111). According to the results of Rutherford backscattering (RBS)/channeling along axis, the conventional θ—2θ scans normal to GaN(0002) and (1122) plane at 0° and 180° azimuthal angles, and the reciprocal-space X-ray mapping (RSM) on GaN(1015) plane, we obtained that the crystal quality of the GaN epilayer is perfect with χmin＝1.54%. The crystal lattice constant of AlN, AlxGa1-xN and GaN epilayer has been calculated accurately, the lattice constant of GaN epilayer is almost equal to the theoretic data (aepi=0.31903nm, cepi=0.51837nm). The tetragonal distortion along the depth can got clearly from elastic strains of each layer in the normal and parallel directions, and the tetragonal distortion of GaN epilayer is nearly fully relaxed(eT=0).

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