In
this work, we examined the mechanical durability of island-type
a-IGZO thin-film transistors (TFTs). Island TFTs were fabricated on
polyimide (PI) islands and were transferred to a thermoplastic polyurethane
(TPU) film. In repeated bending tests with a 1.5 mm bending radius,
island TFTs showed less electrical property deterioration than TFTs
on a PI film. We confirmed that the TPU, which has a lower elastic
modulus compared to PI, effectively reduced the curvature of PI island
even under the same bending test conditions. Furthermore, an organic
passivation layer was applied on the upper part of the PI island.
The 3 μm thick organic passivation layer made the TFT layer
more stable against bending and elongation stress. Island TFTs with
an organic passivation layer showed a change in the saturation mobility
of only −2.3% and a change in the threshold voltage of −0.22
V even after 250 000 repetitive bending tests. Additionally,
no change in electrical properties was observed even after 10 000
repeated stretching test cycles under 30% uniaxial elongation. Finally,
we fabricated island-type logic circuits based on a-IGZO TFTs for
wearable electronic applications. Using the organic passivation layer,
we showed that the NMOS pseudoinverter and NAND gate also operated
without significant deterioration in 100 000 repeated bending
cycles and 5000 repeated stretching cycles. After applying repeated
mechanical stresses, the high output voltage (V
OH) and low output voltage (V
OL) of the inverter only changed from 8.85 to 8.93 V and from 0.44
to 0.50 V, respectively. In NAND gates, V
OH and V
OL only changed slightly from 8.46
to 8.56 V and from 0.45 to 0.55 V, respectively.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.