The paper presents the results of using sub-contact layers with a band gap from 0.35 to 0.8 eV to obtain low-resistance electrical contacts to p-InP. An experimental dependence of the contact resistance on the band gap of the sub-contact material In(x)Ga(1-x)As is obtained.

No abstract

The results of investigations by the method of Electron beam-induced current of p-n junctions based on InP with GaP crystallites in the space charge region are presented. It is shown that the introduction of crystallites into the space charge region leads to short-circuiting of the p-n junction. The quality of the material grown on top of the crystallites allows to create of photoactive regions, as evidenced by measurements of the photoluminescence spectra.

One of the interesting materials for the antireflective coatings of photovoltaic converters based on InP is the anodic oxide of indium phosphide. This material might be used as a first layer of a multilayer antireflection coating, as well as an independent single-layer antireflection coating. This paper deals with the study of the coating and research of its effect on the reflection coefficient from the InP surface.

It is necessary to minimize the resistance of electrical contacts to reduce heat losses in photovoltaic converters of laser radiation. The paper describes ways to reduce the resistance of electrical contacts for p-InP by choosing the composition of the subcontact layer based on p-InGaAs. For this purpose, layers of p-InGaAs with different compositions and bandgaps were grown by the MOCVD method. AgMn/Ni/Au contact metallization was deposited on samples to compare the characteristics of electrical contacts. The minimum specific contact resistance was 7• 10−5 Ω-cm2 for the layer with Eg = 0.51 eV.