It was found that the silicon preliminarily doped with a high concentration of phosphorus during the diffusion of gallium, there is a significant increase in the solubility of the gallium. The results obtained are explained by the interaction of gallium and phosphorus atoms, as a result of which quasi-neutral molecules [P+Ga-] are formed. It is assumed that the formation of such quasineutral molecules [P+Ga–] stimulates the formation of Si2GaP binary unit cells in the silicon lattice. It is shown that a sufficiently high concentration of such unit cells can lead to a significant change in the electrophysical parameters of silicon, i.e. the possibility of obtaining a new material based on silicon.

The effect of doping with nickel on the parameters of silicon photocells, in which the p – n junction was created by impurities of III (B, Ga) and V (P, Sb) groups, has been studied. It is shown that the positive effect of nickel on the photocell efficiency does not depend on the type of initial silicon and on the nature of impurities used to obtain the p – n junction, but is mainly determined by the gettering properties of the near-surface nickel-enriched layer

Исследовалась диффузия из слоя фосфида галлия GaP, напыленного на поверхность кремния. После диффузии образцы кремния исследовались методом Ван-дер-Пау и с помощью сканирующего электронного микроскопа, с целью определения концентрационного распределения примесных атомов фосфора и галлия. Ключевые слова: диффузия, фосфид галлия, кремний, растворимость, концентрация, бинарные комплексы.