Proceedings of the IEEE Custom Integrated Circuits Conference
DOI: 10.1109/cicc.1992.591341
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3.3V-5V compatible I/O circuit without thick gate oxide

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Cited by 27 publications
(13 citation statements)
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“…Besides, the PMOS devices in stacked configuration occupy more silicon area. In case of the mixedvoltage I/O buffer with a depletion PMOS device as discussed in [3] uses an extra pad that is connected to 3.3-V power supply (VDDH).However, using the depletion device increases mask layer and process modification. Thus, the fabrication cost of such I/O buffer design will be increased.…”
Section: A Prior Designsmentioning
confidence: 98%
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“…Besides, the PMOS devices in stacked configuration occupy more silicon area. In case of the mixedvoltage I/O buffer with a depletion PMOS device as discussed in [3] uses an extra pad that is connected to 3.3-V power supply (VDDH).However, using the depletion device increases mask layer and process modification. Thus, the fabrication cost of such I/O buffer design will be increased.…”
Section: A Prior Designsmentioning
confidence: 98%
“…In the earlier designs as discussed in [1], [2], [3], [4] because the floating n-well is clamped to 2.5Vor 3.3V through the parasitic diodes by some dynamic n-well bias circuits the voltage on the floating n-well will be a little lower than 2.5 V or 3.3 V. The lower floating n-well voltage results in the lower threshold voltage of the pull-up PMOS transistor. Thus, the subthreshold leakage current becomes large when the pull-up PMOS transistor is in off state.…”
Section: A Prior Designsmentioning
confidence: 99%
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“…While the latter is fully compatible with standard integration processes, the former is restricted to fabrication processes featuring such a sort of device, although several design techniques relying on DM P-MOSFETs have been reported, e.g. [10][11][12][13][14][15][16].…”
Section: Introductionmentioning
confidence: 99%
“…To solve the gate-oxide reliability issue without using the additional thick gate oxide process (also known as dual gate oxides in some CMOS processes [5], [6]), the stacked-MOS configuration has been widely used in the mixed-voltage I/O buffers [7]- [12], and in the power-rail ESD clamp circuits [13]. The typical 3-V/5-V-tolerant mixed-voltage I/O circuit is shown in Fig.…”
Section: Introductionmentioning
confidence: 99%