1,2,3-Thiadiazoles with polymerizable functionalities in the 4-position were synthesized as potential negative photoresists. The polymerization to soluble, film-forming materials must leave the heterocyclic rings intact, because they are needed for photocrosslinking reactions to give insoluble materials. 1,2,3-Thiadiazoles 1 cycloeliminate N 2 on irradiation. The resulting 1,3-diradicals 2 have various options for stabilization processes leading to alkynes 3 or to higher heterocycles 5-12. The generation of atomic sulfur and its involvement in these subsequent reactions must be avoided. Therefore, systems like model compound 1a, in which the 1,3diradicals form 2-methylene-1,3-dithioles (dithiafulvenes) 9 were selected here. Optimization gave ultimately two materials for application as photoresists. Monomer 1c could be polymerized in the presence of boron trifluoride to soluble 1c¢, which on irradiation formed 1c¢¢ as a cross-linked insoluble polymer. Furthermore, thiadiazole 1f was attached to polystyrene 26. The resulting soluble polymer 1i¢ yielded the insoluble material 1i¢¢ on irradiation.