2021 IEEE International Memory Workshop (IMW) 2021
DOI: 10.1109/imw51353.2021.9439611
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A Back-End-Of-Line Compatible, Ferroelectric Analog Non-Volatile Memory

Abstract: A Ferroelectric Analog Non-Volatile Memory based on a WOx electrode and ferroelectric HfZrO4 layer is fabricated at a low thermal budget (~375˚C), enabling BEOL processes and CMOS integration. The devices show suitable properties for integration in crossbar arrays and neural network inference: analog potentiation/depression with constant field or constant pulse width schemes, cycle to cycle and device to device variation <10%, ON/OFF ratio up to 10 and good linearity. The physical mechanisms behind the resisti… Show more

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Cited by 6 publications
(3 citation statements)
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“…Part of this work was presented at IEEE EDTM (2021), see reference [34], as well as IEEE IMW (2021), see reference [35].…”
Section: Conference Proceedingsmentioning
confidence: 99%
“…Part of this work was presented at IEEE EDTM (2021), see reference [34], as well as IEEE IMW (2021), see reference [35].…”
Section: Conference Proceedingsmentioning
confidence: 99%
“…We assume that the weight can change in a linear fashion without any noise. Nonlinear and asymmetric behaviour is often observed in practice but can be linearized by various pulse duration or amplitude variation schemes [22]. Lithium ion-based memristors can have a high degree of linearity but with limited dynamic range [23].…”
Section: Comparison With Analog Deterministic Synapsesmentioning
confidence: 99%
“…However, perovskite-based FTJs unfortunately suffer poor compatibility with CMOS technology. Therefore, as Böscke et al demonstrated ferroelectricity in thin-film HfO 2 , a material already integrated in CMOS, research on FTJs picked up steam and there are now many examples of HfO 2 -based FTJs in the literature. ,, Nevertheless, the performance of HfO 2 -based FTJs is still inferior to that of the perovskite-based device; with lower read currents, endurance, limited retention and small TER still restricting the technology. Moreover, the diminishing ferroelectric behavior for films below 5 nm , is posing a challenge in improving the low read current of these devices. This has been attributed to a strongly increasing energy barrier for crystallization in ultrathin HfO 2 /ZrO 2 films .…”
Section: Introductionmentioning
confidence: 99%