Ohmic, memristive synaptic weights are fabricated with a back‐end‐of‐line compatible process, based on a 3.5 nm HfZrO4 thin film crystallized in the ferroelectric phase at only 400 °C. The current density is increased by three orders of magnitude compared to the state‐of‐the‐art. The use of a metallic oxide interlayer, WOx, allows excellent retention (only 6% decay after 106 s) and endurance (1010 full switching cycles). The On/Off of 7 and the small device‐to‐device variability (<5%) make them promising candidates for neural networks inference. The synaptic functionality for online learning is also demonstrated: using pulses of increasing (resp. constant) amplitude and constant (resp. increasing) duration, emulating spike‐timing (resp. spike‐rate) dependent plasticity. Writing with 20 ns pulses only dissipate femtojoules. The cycle‐to‐cycle variation is below 2%. The training accuracy (MNIST) of a neural network is estimated to reach 92% after 36 epochs. Temperature‐dependent experiments reveal the presence of allowed states for charge carriers within the bandgap of hafnium zirconate. Upon polarization switching, the screening of the polarization by mobile charges (that can be associated with oxygen vacancies and/or ions) within the ferroelectric layer modifies the energy profile of the conduction band and the bulk transport properties.

Two-terminal ferroelectric synaptic weights are fabricated on silicon. The active layers consist of a 2 nm thick WOx film and a 2.7 nm thick HfZrO4 (HZO) film grown by atomic layer deposition. The ultra-thin HZO layer is crystallized in the ferroelectric phase using a millisecond flash at a temperature of only 500°C, evidenced by X-Rays diffraction. The current density is increased by four orders of magnitude compared to weights based on a 5 nm thick HZO film. Potentiation and depression (analog resistive switching) is demonstrated using either pulses of constant duration (as short as 20 nanoseconds) and increasing amplitude, or pulses of constant amplitude (+/- 1V) and increasing duration. The cycle-to-cycle variation is below 1%. Temperature dependent electrical characterization is performed on a series of device cycled up to 108 times: they reveal that HZO possess semiconducting properties. The fatigue leads to a decrease, in the high resistive state only, of the conductivity and of the activation energy.

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A Ferroelectric Analog Non-Volatile Memory based on a WOx electrode and ferroelectric HfZrO4 layer is fabricated at a low thermal budget (~375˚C), enabling BEOL processes and CMOS integration. The devices show suitable properties for integration in crossbar arrays and neural network inference: analog potentiation/depression with constant field or constant pulse width schemes, cycle to cycle and device to device variation <10%, ON/OFF ratio up to 10 and good linearity. The physical mechanisms behind the resistive switching and conduction mechanisms are discussed.

A Ferroelectric Analog Non-Volatile Memory based on a WOx electrode and ferroelectric HfZrO4 layer is fabricated at a low thermal budget (~375˚C), enabling BEOL processes and CMOS integration. The devices show suitable properties for integration in crossbar arrays and neural network inference: analog potentiation/depression with constant field or constant pulse width schemes, cycle to cycle and device to device variation <10%, ON/OFF ratio up to 10 and good linearity. The physical mechanisms behind the resistiv e switching and conduction mechanisms are discussed. I.