1995
DOI: 10.1016/0167-9317(94)00111-7
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A high-power, low-contamination laser plasma source for Extreme UV lithography

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Cited by 9 publications
(3 citation statements)
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“…All experiments were performed at the laser plasma source and EUV imaging facility at the FOM Institute for Plasma Physics Rijnhuizen [4,7]. To generate the plasmas, an application-speciÐc KrF laser (Lambda Physik LPX350cc) was employed in the injection-locked mode of operation.…”
Section: Methodsmentioning
confidence: 99%
“…All experiments were performed at the laser plasma source and EUV imaging facility at the FOM Institute for Plasma Physics Rijnhuizen [4,7]. To generate the plasmas, an application-speciÐc KrF laser (Lambda Physik LPX350cc) was employed in the injection-locked mode of operation.…”
Section: Methodsmentioning
confidence: 99%
“…The goal of this work was to perform a detailed spectroscopic, temporal, and spatial investigation of the laser plasma source for EUVL applications [2]. EXPERIMENTAL All experiments were peformed at the laser plasma source and EUV imaging facility at the FOM Institute for Plasma Physics Rijnhuizen [3,4] . To generate the plasmas, an injection-locked 42 W KrF laser (Lambda Physik LPX35Occ) was employed.…”
Section: Introductionmentioning
confidence: 99%
“…This is due to the requirement for increasing the lifetime of EUV optical elements. The experiments included, amongst others, the conception of blocking the emission of particles by means of electric fields, protective gas with a particle trap or using the double plasma [41][42][43][44]. Targets made from tin and lithium have failed so far to entirely eliminate the damaging activity of the particles ejected from the target without considerably decreasing the EUV emission.…”
mentioning
confidence: 99%