2022
DOI: 10.3390/s22103640
|View full text |Cite
|
Sign up to set email alerts
|

A Micropowered Chemoresistive Sensor Based on a Thin Alumina Nanoporous Membrane and SnxBikMoyOz Nanocomposite

Abstract: This work presents and discusses the design of an efficient gas sensor, as well as the technological process of its fabrication. The optimal dimensions of the different sensor elements including their deformation were determined considering the geometric modeling and the calculated moduli of the elasticity and thermal conductivity coefficients. Multicomponent SnxBikMoyOz thin films were prepared by ionic layering on an anodic alumina membrane and were used as gas-sensitive layers in the sensor design. The resi… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2023
2023
2024
2024

Publication Types

Select...
5

Relationship

1
4

Authors

Journals

citations
Cited by 6 publications
(2 citation statements)
references
References 51 publications
0
2
0
Order By: Relevance
“…In 2 O 3 films are also widely used in gas sensors, but their electrical parameters differ significantly from those of SnO 2 [20][21][22]45]. The combination of these two materials retains the merits of both while smoothing out problematic issues in their use, including minimizing resistivity [46]. However, obtaining In 2 O 3 -SnO 2 films of the required composition using plasma physicochemical deposition methods is associated with certain difficulties, consisting of a significant difference between the evaporation temperatures of indium and tin compounds, as well as the need to provide different evaporation rates.…”
Section: Deposition Of Gas-sensitive Layermentioning
confidence: 99%
“…In 2 O 3 films are also widely used in gas sensors, but their electrical parameters differ significantly from those of SnO 2 [20][21][22]45]. The combination of these two materials retains the merits of both while smoothing out problematic issues in their use, including minimizing resistivity [46]. However, obtaining In 2 O 3 -SnO 2 films of the required composition using plasma physicochemical deposition methods is associated with certain difficulties, consisting of a significant difference between the evaporation temperatures of indium and tin compounds, as well as the need to provide different evaporation rates.…”
Section: Deposition Of Gas-sensitive Layermentioning
confidence: 99%
“…The use of porous anodic aluminium oxide (AAO) as a substrate for metal thin films offers several advantages over Si-based technology [40]. Firstly, the porous structure of AAO provides high adhesion of metal films due to a partial metal deposition into AAO pores during the film sputtering.…”
Section: Introductionmentioning
confidence: 99%