Proceedings of the 13th International Symposium on Power Semiconductor Devices &Amp; ICs. IPSD '01 (IEEE Cat. No.01CH37216)
DOI: 10.1109/ispsd.2001.934620
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A novel, 1.2 kV trench clustered IGBT with ultra high performance

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Cited by 13 publications
(9 citation statements)
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“…In [13] thyristor action is shown (via simulations) through the p ring, but this relies on electron injection from an accumulation layer rather than from the n enhancement. Cluster IGBT [14] also displays a thyristor action with enhanced electron injection. In the CIGBT the p-well encloses the n-well and isolates it from the drift region; this is not the case in our structure and no charge compensation between the n-well and p-well is discussed in [14].…”
Section: Device Structurementioning
confidence: 99%
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“…In [13] thyristor action is shown (via simulations) through the p ring, but this relies on electron injection from an accumulation layer rather than from the n enhancement. Cluster IGBT [14] also displays a thyristor action with enhanced electron injection. In the CIGBT the p-well encloses the n-well and isolates it from the drift region; this is not the case in our structure and no charge compensation between the n-well and p-well is discussed in [14].…”
Section: Device Structurementioning
confidence: 99%
“…Cluster IGBT [14] also displays a thyristor action with enhanced electron injection. In the CIGBT the p-well encloses the n-well and isolates it from the drift region; this is not the case in our structure and no charge compensation between the n-well and p-well is discussed in [14]. The charge compensation between the pring and the n-enhancement is essential here for achieving a superjunction effect.…”
Section: Device Structurementioning
confidence: 99%
“…The CIGBT/TCIGBT operating mechanism has been discussed in several publications [2][3][4][5][6][7][8][9]. The deep p-well/n-drift junction is mainly used to support voltage in the off-state.…”
Section: Device Technologiesmentioning
confidence: 99%
“…is a MOS-gate controlled three terminal thyristor structure device showing current saturation characteristics at high gate voltages and a short circuit performance. The excellent performance of the CIGBT family of devices is due to a unique 'self-clamping' feature that limits the potential of the cathode cells and also enables fast turn-off [2][3][4][5][6][7][8][9]. Experimental planar CIGBTs have shown superior performance to IGBT at 1.2kV to 3.3kV, while T-CIGBT has also been experimentally demonstrated at 1.2kV [3,4].…”
Section: Introductionmentioning
confidence: 99%
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