A Simple Route to Metal Nanodots and Nanoporous Metal Films

Shin, Kyusoon; Leach, K. Amanda; Goldbach, James T.; Kim, Dong Ha; Jho, Jae Young; Tuominen, Mark; Hawker, Craig J.; Russell, Thomas P.

doi:10.1021/nl0256560

Cited by 240 publications

(206 citation statements)

References 29 publications

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“…Lift-off techniques which involve the vacuum evaporation of an inorganic material into the nanometer pores of a developed block copolymer mask are probably the most direct way to transfer patterns to fabricate magnetic [9,10] and nanoelectrode arrays [11]. Alternatively, many of the etching techniques used above can be transferred to underlying metal layers.…”

Section: Nanolithographymentioning

confidence: 99%

Patterning with block copolymer thin films

Segalman

2005

Materials Science and Engineering: R: Reports

933

921

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The nanometer-scale architectures in thin films of self-assembling block copolymers have inspired a variety of new applications. For example, the uniformly sized and shaped nanodomains formed in the films have been used for nanolithography, nanoparticle synthesis, and high-density information storage media. Imperative to all of these applications, however, is a high degree of control over orientation of the nanodomains relative to the surface of the film as well as control over order in the plane of the film. Induced fields including electric, shear, and surface fields have been demonstrated to influence orientation. Both heteroepitaxy and graphoepitaxy can induce positional order on the nanodomains in the plane of the film. This article will briefly review a variety of mechanisms for gaining control over block copolymer order as well as many of the applications of these materials. Particular attention is paid to the potential of perfecting long-range two-dimensional order over a broader range of length scales and the extension of these concepts to functional materials and more complex architectures. #

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Section: Nanolithographymentioning

confidence: 99%

Patterning with block copolymer thin films

Segalman

2005

Materials Science and Engineering: R: Reports

933

921

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“…[1][2][3][4][5][6][7][8] The directed self-assembly of diblock copolymers is particularly important due to the emergence of block copolymer lithography as a simple route to generate scaffolds and templates for nanostructured materials. [9][10][11][12][13][14][15] Control over the microdomain orientation and lateral order is essential in this application, and a number of strategies have been developed to achieve this goal. To this end, controlled interfacial interactions 1,[16][17][18] and external fields, like electric fields, [19][20][21][22] solvent evaporation, [23][24][25][26][27] epitaxy, [28][29][30] and surface patterning [31][32][33][34][35][36] have been used.…”

Section: Introductionmentioning

confidence: 99%

Surface Modification with Cross-Linked Random Copolymers: Minimum Effective Thickness

et al. 2007

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Ultrathin films of benzocyclobutene (BCB)-functionalized random copolymer with styrene and methyl methacrylate, P(S-r-BCB-r-MMA), with thicknesses ranging from 0 to 10.5 nm, were thermally crosslinked on Si substrates. The penetration of deuterated PMMA (dPMMA) into the P(S-r-BCB-r-MMA) films and the microdomain orientation of PS-b-PMMA diblock copolymers on P(S-r-BCB-r-MMA) coated substrates were investigated by neutron reflectivity (NR) and scanning force microscopy (SFM), respectively. NR measurements on bilayers of dPMMA on cross-linked P(S-r-BCB-r-MMA) showed that the neutron scattering length density (SLD) at the substrate was equal to that of P(S-r-BCB-r-MMA) if the P(S-r-BCB-r-MMA) film was thicker than ∼5.5 nm. With decreasing thickness of the P(S-r-BCB-r-MMA) film, the SLD at the substrate increased, characteristic of an increasing penetration of the dPMMA. When thin films of PS-b-PMMA diblock copolymer having cylindrical microdomains are placed on surfaces modified with cross-linked films of P(S-r-BCB-r-MMA) thinner than ∼5.5 nm, the cylindrical microdomains orient parallel to the surface, whereas for thicker films, the microdomains orient normal to the surface. Both of these results indicate that interfacial interactions are screened when the P(S-r-BCB-r-MMA) film is thicker than ∼5.5 nm.

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“…In particular, perpendicularly oriented cylinder structures to a substrate have been used as templates for a number of applications, including photonic crystals [2][3], nanowires [4], nanodot arrays [5][6], magnetic storage devices [7][8], and nanomembrane filters [9]. Perpendicular orientation of cylinder forming block copolymer is held by means of surface neutralization [10][11], chemical patterning [7][8]12], solvent annealing [13][14], graphoepitaxy [15], and electric fields [4].…”

Section: Introductionmentioning

confidence: 99%