2007
DOI: 10.1143/jjap.46.l503
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A Vertical Insulated Gate AlGaN/GaN Heterojunction Field-Effect Transistor

Abstract: We fabricated a vertical insulated gate AlGaN/GaN heterojunction field-effect transistor (HFET), using a free-standing GaN substrate. This HFET has apertures through which the electron current vertically flows. These apertures were formed by dry etching the p-GaN layer below the gate electrodes and regrowing n À -GaN layer without mask. The HFET exhibited a specific on-resistance of as low as 2.6 mÁcm 2 with a threshold voltage of À16 V. This HFET would be a prototype of a GaN-based high-power switching device. Show more

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Cited by 169 publications
(93 citation statements)
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“…However, these substrates had a dislocation density of ∼10 6 cm −2 , which is too high for fabricating highvoltage (∼1 kV) vertical power devices. Several reports on vertical GaN devices fabricated on GaN substrates have been published [23,24,25,26,27], but their performance was inferior to that of SiC and Si power devices. Although this was mainly due to the low crystal quality, the experiments also identified many problems with the device fabrication process.…”
Section: Vertical Gan Power Devicesmentioning
confidence: 99%
“…However, these substrates had a dislocation density of ∼10 6 cm −2 , which is too high for fabricating highvoltage (∼1 kV) vertical power devices. Several reports on vertical GaN devices fabricated on GaN substrates have been published [23,24,25,26,27], but their performance was inferior to that of SiC and Si power devices. Although this was mainly due to the low crystal quality, the experiments also identified many problems with the device fabrication process.…”
Section: Vertical Gan Power Devicesmentioning
confidence: 99%
“…[2][3][4][5][6][7] The GaN device has once again attracted our attention because of its excellent characteristics as a power device. 8,9 It has a superior breakdown field, a high electron saturation velocity, and a wide bandgap energy compared with those features of Si based power devices. 10,11 Many GaN devices have been grown on other substrates, such as sapphire, Si, and SiC substrates, through hetero-epitaxial growth.…”
Section: Introductionmentioning
confidence: 99%
“…The coherent charge relaxation models require the use of solid-state materials for their implementation. One of the possible applications is, for example, to insulated and suspended gate FET devices (37,38) that may use a selective layer made of conducting polymer (37). Application of the proposed sensing mechanisms to the devices in refs.…”
Section: Limits Of Applicabilitymentioning
confidence: 99%