2011
DOI: 10.1109/tii.2010.2098416
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A Virtual Metrology System for Predicting End-of-Line Electrical Properties Using a MANCOVA Model With Tools Clustering

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Cited by 26 publications
(10 citation statements)
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“…Zeng and Spanos [8] employed various statistic techniques to create the VM model of the plasma etching process. Pan et al [9] utilized a MANCOVA model and the tools clustering technique to create a VM model for predicting end-of-line electrical properties of wafers. Fan and Chang [10] applied VM to develop an advanced process control system for the MIMO (Multiple-Input MultipleOutput) semiconductor processes.…”
Section: Related Workmentioning
confidence: 99%
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“…Zeng and Spanos [8] employed various statistic techniques to create the VM model of the plasma etching process. Pan et al [9] utilized a MANCOVA model and the tools clustering technique to create a VM model for predicting end-of-line electrical properties of wafers. Fan and Chang [10] applied VM to develop an advanced process control system for the MIMO (Multiple-Input MultipleOutput) semiconductor processes.…”
Section: Related Workmentioning
confidence: 99%
“…Most VM systems in the existing VM-related literature (such as Refs. [6][7][8][9][10][11][12][13]) did not address the plant-wide VM deployment issue.…”
Section: Related Workmentioning
confidence: 99%
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“…ETROLOGY is a critical activity in industry [21], [23] and, in particular in semiconductor manufacturing [13], [27], where it is increasingly becoming the focus of attention as feature sizes continue to shrink and wafer diameters increase from the current industrial standards of 200 mm and 300 mm to 450 mm [11]. In Chemical Vapor Deposition (CVD), for example, the feature of interest is the depth of the layer/film of material deposited on the wafer [22], while in plasma etching it is the dimensions (depth and width) of the trenches etched into the wafer surface [18].…”
mentioning
confidence: 99%
“…The proposed robust state-awareness architecture is based on the previously proposed anomaly detection methodology for advanced control systems [7]. The proposed FN-DFE architecture uses computational intelligence (CI) algorithms such as artificial neural networks (ANN) and fuzzy logic systems (FLS) for system behavior modeling, prediction, and anomaly detection [8]- [12].…”
mentioning
confidence: 99%