Active disturbance rejection control for a piezoelectric nano-positioning system: A U-model approach

Abstract

Both speed and accuracy are key issues in nano-positioning. However, hysteresis existing in piezoelectric actuators severely reduces the positioning speed and accuracy. In order to address the hysteresis, a U-model based active disturbance rejection control is proposed. Based on the linear active disturbance rejection control, a controlled plant is dynamically transformed to be pure integrators. Then, according to the U-model control, a common inversion is obtained and the controlled plant is converted to be “1.” By integrating advantages of both linear active disturbance rejection control and U-model control, the U-model based active disturbance rejection control does promote the reference tracking speed and accuracy. Stability and steady-state error of the close-loop system have been analyzed. Phase lag between the system output and the control input has been effectively eliminated, and the phase-leading advantage of the U-model based active disturbance rejection control has been confirmed. Experimental results show that the U-model based active disturbance rejection control is capable of achieving faster and more accurate positioning. Remarkable improvements and practical realization make the U-model based active disturbance rejection control more promising in nano-positioning.

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