2009 IEEE International Conference on 3D System Integration 2009
DOI: 10.1109/3dic.2009.5306555
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Advanced 3D chip stack process for thin dies with fine pitch bumps using pre-applied inter chip fill

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Cited by 5 publications
(6 citation statements)
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“…Characterization of micro-bumps for silicon carrier applications was carried out by Wright et al [52], who concluded that contact resistance was found to be about the same for eutectic SnPb as well as SnCu solder compositions, and at most 2-3 times larger than the standard 100 µm bumps. Further work in this field has been conducted by others [53][54][55]. Thus, although microbumps are not mandated for all 3D die stacking, their importance will increase in proportion to the requirement of having a tightly packed grid of interconnections between opposing die.…”
Section: Micro Bump Technologymentioning
confidence: 95%
“…Characterization of micro-bumps for silicon carrier applications was carried out by Wright et al [52], who concluded that contact resistance was found to be about the same for eutectic SnPb as well as SnCu solder compositions, and at most 2-3 times larger than the standard 100 µm bumps. Further work in this field has been conducted by others [53][54][55]. Thus, although microbumps are not mandated for all 3D die stacking, their importance will increase in proportion to the requirement of having a tightly packed grid of interconnections between opposing die.…”
Section: Micro Bump Technologymentioning
confidence: 95%
“…1). The relationship between refraction coefficients and reflection coefficients can be formulated as (1).…”
Section: System Modelmentioning
confidence: 99%
“…Considering that the complete refraction and reflection process of the path in 3DWiNoC is complex and difficult to completely and clearly described, the modeling can be implemented in the following order (1)(2)(3).…”
Section: System Modelmentioning
confidence: 99%
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