Technical Digest., International Electron Devices Meeting
DOI: 10.1109/iedm.1988.32909
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Advanced self-alignment process technique with very thick sidewall for high speed GaAs LSIs

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Cited by 9 publications
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“…The LSI was fabricated by the very thick side-wall process [5]. The function of the LSI is 8 X 16 D-FF matrix.…”
Section: Of Svstemmentioning
confidence: 99%
“…The LSI was fabricated by the very thick side-wall process [5]. The function of the LSI is 8 X 16 D-FF matrix.…”
Section: Of Svstemmentioning
confidence: 99%