2020
DOI: 10.1016/j.nimb.2020.03.001
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All-silicon subwavelength structural coloration fabricated through proton beam writing and reactive ion etching

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Cited by 6 publications
(3 citation statements)
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“…An alternative is to use dielectrics/semiconductors with low optical losses that support Mie resonances. [96][97][98][99][100][101][102][103][104][105][106][107][108] High-refractive-index dielectrics/semiconductors such as silicon (Si) and titanium oxide (TiO 2 ) support resonances and are typically called Mie resonators, in that they can be described 8 by Mie theory (though metallic particles supporting LSPR can be modeled by Mie theory as well). [109][110][111][112][113][114][115][116][117][118][119][120] The fundamental multipoles (i.e., electric dipole, magnetic dipole) in the Mie resonances can produce high-quality-factor resonances (in a material with a refractive index larger than 2), due to the negligible intrinsic loss.…”
Section: Structural Color Generation Methods and Relevant Applicationsmentioning
confidence: 99%
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“…An alternative is to use dielectrics/semiconductors with low optical losses that support Mie resonances. [96][97][98][99][100][101][102][103][104][105][106][107][108] High-refractive-index dielectrics/semiconductors such as silicon (Si) and titanium oxide (TiO 2 ) support resonances and are typically called Mie resonators, in that they can be described 8 by Mie theory (though metallic particles supporting LSPR can be modeled by Mie theory as well). [109][110][111][112][113][114][115][116][117][118][119][120] The fundamental multipoles (i.e., electric dipole, magnetic dipole) in the Mie resonances can produce high-quality-factor resonances (in a material with a refractive index larger than 2), due to the negligible intrinsic loss.…”
Section: Structural Color Generation Methods and Relevant Applicationsmentioning
confidence: 99%
“…In addition, Au and Ag are not compatible with complementary-metal–oxide–semiconductor (CMOS) processes and cannot be incorporated into semiconductor manufacturing processes. An alternative is to use dielectrics/semiconductors with low optical losses that support Mie resonances. …”
Section: Structural Color Generation Methods and Relevant Applicationsmentioning
confidence: 99%
“…The proton beam writing (PBW) beamline at the Centre for Ion Beam Application (CIBA) in Singapore [23][24][25][26] is a state-of-the-art powerful direct-write implantation facility holding tremendous potential for in bulk diamond micro-/nanostructuring. The 3.5 MV high energy singletron accelerator in CIBA has a superior beam energy stability of around AE20 eV.…”
Section: Methodsmentioning
confidence: 99%