An Approach to Fabrication of Metal Nanoring Arrays

Bayati, Maryam; Patoka, Piotr; Giersig, Michael; Savinova, Elena R.

doi:10.1021/la904287t

Cited by 42 publications

(25 citation statements)

References 48 publications

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“…Using the fabricated high-resolution polymer pattern as a mask, subsequent materials are etched to obtain a high-resolution pattern with the desired material. [137][138][139][140][141][142][143][144][145] As a result, as shown in Figure 4d, a very thin line pattern can be obtained. [146] As with other edge lithography methods, both the effect of reducing the pitch in half and the size of the pattern can be achieved.…”

Section: Edge-spreading Lithography and Modified Capillary Lithographymentioning

confidence: 83%

Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography

et al. 2020

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The development of a simple and cost‐effective method for fabricating ≈10 nm scale nanopatterns over large areas is an important issue, owing to the performance enhancement such patterning brings to various applications including sensors, semiconductors, and flexible transparent electrodes. Although nanoimprinting, extreme ultraviolet, electron beams, and scanning probe litho‐graphy are candidates for developing such nanopatterns, they are limited to complicated procedures with low throughput and high startup cost, which are difficult to use in various academic and industry fields. Recently, several easy and cost‐effective lithographic approaches have been reported to produce ≈10 nm scale patterns without defects over large areas. This includes a method of reducing the size using the narrow edge of a pattern, which has been attracting attention for the past several decades. More recently, secondary sputtering lithography using an ion‐bombardment technique was reported as a new method to create high‐resolution and high‐aspect‐ratio structures. Recent progress in simple and cost‐effective top‐down lithography for ≈10 nm scale nanopatterns via edge and secondary sputtering techniques is reviewed. The principles, technical advances, and applications are demonstrated. Finally, the future direction of edge and secondary sputtering lithography research toward issues to be resolved to broaden applications is discussed.

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Section: Edge-spreading Lithography and Modified Capillary Lithographymentioning

confidence: 83%

Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography

et al. 2020

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“…Estas se interrelacionan y hay cierto nivel de dependencia. La psicología religiosa contemporánea reconoce la relación dialéctica y dinámica con Dios como una dimensión importante del ser humano (Ilievski, 2015).…”

Section: Ejercicio Investigativo En Psicología De La Religiónunclassified

University Social Responsibility: Perspective and contributions from a confessional university.

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Núñez

2018

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En el argumento del presente artículo se ostentan algunas revisiones históricas y descriptivas de la psicología de la religión; se refieren y diferencian determinadas nociones como “psicología de la religión”, “psicología y religión”, y “psicología religiosa”, se advierte de las modificaciones conceptuales de diferentes enfoques y corrientes afirmados en el área, como el de naturaleza fenomenológica; y se reseñan algunos estudios de la actualidad investigativa por continentes.

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“…の機能を発現することが知られており，センサー [1]，反射防止膜 [2,3]，アンチグレアフィルム [4]，太陽電池の効率向上 [5,6]など，幅広い分野での応用が期待される。さらに，単層膜を鋳型として用いることでナノ構造を作製する，いわゆるコロイドリソグラフィのマスクとしての用途も報告されている [7]。コロイドリソグラフィによって得られる集合体の典型例は，三角形 [8]，円盤 [9]，柱 [10]，円錐 [11]，三日月 [12] Corresponding Authors *nabe@cheme.kyoto-u.ac.jp **miyahara@cheme.kyoto-u.ac.jp 積を利用したボトムアップ型の手法が望ましく，これまでに，液滴乾燥法 [14]，Langmuir-Blodgett 法 [15]，スピンコート法 [16]，移流集積法 [17,18] (Fig. 4 (a) (Fig.…”

Section: 緒言コロイド粒子が規則的に配列した単層膜は，粒子の種類やサイズに応じて，その構造の規則性に起因した種々unclassified

Monolayer Formation of Submicron-sized Colloidal Particles by Drag Coating Convective Self-assembly

et al. 2018

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Monolayer films composed of ordered particle arrays exhibit unique optical properties, which lead to various potential applications like sensors and antireflective coatings. In this study, we investigated particle deposition processes by using a drag coating technique based on convective self-assembly. Unlike micron-sized particles, 300-nm particles formed submonolayers instead of monolayers. Hence, we modified the technique and demonstrated that reversed dragging, introduction of a film blade, and periodic change in deposition speed dramatically improved the particle deposition process to cover the entire substrate surface uniformly with a monolayer of ordered particle arrays. Furthermore, our modified drag coating process produced monolayers of particles with different sizes of 570, 120, 45, and 27 nm. Thus, our technique is simple and versatile, and is applicable to a wide particle size ranging from microns to tens of nanometers.

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An Approach to Fabrication of Metal Nanoring Arrays

Cited by 42 publications

References 48 publications

Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography

Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography

University Social Responsibility: Perspective and contributions from a confessional university.

Monolayer Formation of Submicron-sized Colloidal Particles by Drag Coating Convective Self-assembly

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