An atmospheric pressure inductively coupled microplasma source of vacuum ultraviolet light

Sato, Ryoto; Yasumatsu, Daisuke; Kumagai, Shinya; Takeda, Keigo; Hori, Masaru; Sasaki, Minoru

doi:10.1016/j.sna.2013.09.018

Cited by 15 publications

(11 citation statements)

References 29 publications

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“…In contrast, the UNCD –200 V films can be turned on at much smaller field, that is, ( E 0 ) UNCD(−200 V) = 6.56 V/μm with a ( J e ) UNCD (−200 V) value of 1.35 mA/cm 2 at an applied field of 10.46 V/μm. Moreover, by assigning a φ value of 5.2 eV for diamond materials, large field enhancement factors of (β) UNCD(0 V) = 672 and (β) UNCD (−200 V) = 1873 were obtained for UNCD 0 V and UNCD –200 V films, respectively.…”

Section: Resultsmentioning

confidence: 99%

“…Electron field emitters (EFEs) play significant roles in micro/nanovacuum devices and optoelectronic applications such as field emission displays (FPD), vacuum amplifiers, field emission X-ray sources, and electron microtips. − Besides the great potential of EFEs in these applications, the utilization of high EFEs as cathode in microplasma (MP) devices has been demonstrated to be critical in enhancing the performance of the devices. , Generally, the MP devices are useful in many remarkable applications such as ozone production, display panels, and several bioelectronics and biomedical applications. − Several cold cathode materials, which perform very well in emission of electrons, were developed for these applications such as Mo, ZnO, Si, and CNTs. ,− However, these EFE materials mostly suffer from stability issues, − as cathode materials in a MP device are subjected to continuous plasma ion bombardment. Researchers are keen to develop a new generation of materials for MP devices that can overcome the deficiencies of existing the cathode materials. − Diamond-based materials have been attractive in the pursuit of good cathode materials for MP device applications due to their unique combination of superior EFE performance and MP-related characteristics, because diamond possesses negative electron affinity (NEA), superb electron field emission properties, large secondary electron emission behavior (large γ-coefficient), and high bonding strength (robustness). − …”

Section: Introductionmentioning

confidence: 99%

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High-Performance Electron Field Emitters and Microplasma Cathodes Based on Conductive Hybrid Granular Structured Diamond Materials

Saravanan

Huang

Manoharan

et al. 2017

ACS Appl. Mater. Interfaces

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High-performance diamond electron field emitters (EFEs) with extremely low turn-on field (E = 1.72 V/μm) and high current density (1.70 mA/cm at an applied field of 3.86 V/μm) were successfully synthesized by using a modified two-step microwave plasma chemical deposition process. Such emitters possess EFE properties comparable with most of carbon- or semiconductor-based EFE materials, but with markedly better lifetime stability. The superb EFE behavior of these materials was achieved owing to the reduction in the diamond-to-Si interfacial resistance and the increase in the conductivity of the bulk diamond films (HBD) via the applications of high bias voltage during the preparation of the ultrananocrystalline diamond (UNCD) primary layer and the subsequent plasma post-treatment (PPT) process, respectively. The superior EFE properties along with enhanced robustness of HBD films compared with the existing diamond-based EFE materials rendered these materials of greater potential for applications in high brightness display and multifunctional microplasma.

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

High-Performance Electron Field Emitters and Microplasma Cathodes Based on Conductive Hybrid Granular Structured Diamond Materials

Saravanan

Huang

Manoharan

et al. 2017

ACS Appl. Mater. Interfaces

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“…Chiefly, microplasma-based devices possess a promising future regarding several applications, for example, the production of ozone, the detection of environmentally hazardous gases and vapors, display panels, and several biomedical and bioelectronics applications. [53][54][55] Numerous carbon-based materials such as carbon nanotubes, CNW, graphene, etc. attain high emission of electrons and so are suitable as a cathode for these microplasma devices.…”

Section: Plasma Illumination Studies Of Diamond-enhanced Carbon Nanowallsmentioning

confidence: 99%

Stable Field Electron Emission and Plasma Illumination from Boron and Nitrogen Co‐Doped Edge‐Rich Diamond‐Enhanced Carbon Nanowalls

Ficek

Dec

Sankaran

et al. 2021

Adv Materials Inter

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Superior field electron emission (FEE) characteristics are achieved in edge‐rich diamond‐enhanced carbon nanowalls (D‐ECNWs) grown in a single‐step chemical vapor deposition process co‐doped with boron and nitrogen. The structure consists of sharp, highly conductive graphene edges supplied by a solid, diamond‐rich bottom. The Raman and transmission electron microscopy studies reveal a hybrid nature of sp3‐diamond and sp2‐graphene in these nanowalls. The ab‐initio calculations were carried out to support the experimental observations of diamond‐graphene hybrid structure. Finally, this hybrid D‐ECNWs is employed as a cathode in an FEE device resulting in a low turn‐on field of 3.1 V µm−1, a large field enhancement factor, a high FEE Je of 2.6 mA cm−2, and long lifetime stability of 438 min. Such an enhancement in the FEE originates from the unique materials combination, resulting in good electron transport from the graphene phases and efficient FEE of electrons from the sharp edges on the nanowalls. The prospective application of these materials is displayed by employing these hybrids as cathodes in a microplasma device ensuing a low threshold voltage of 160 V and high plasma stability of 140 min, which confirms the role of these hybrid structured nanowalls in the enhancement of electron emission.

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“…Miniaturized plasma sources have been reported elsewhere. [26][27][28][29][30][31][32] The size of the miniaturized plasma source should be about the same with that of microwells (100 µm).…”

Section: Microplasma Sourcementioning

confidence: 99%

Development of plasma-on-chip: Plasma treatment for individual cells cultured in media

Kumagai

Chang

Jeong

et al. 2015

Jpn. J. Appl. Phys.

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A device consisting of Si microwells and microplasma sources has been fabricated for plasma treatment of individual cells cultured in media. We named the device plasma-on-chip. The microwells have through-holes at the bottom where gas–liquid interfaces form when they are filled with media containing biological samples. The microplasma sources, which supply reactive species, are located on the back of each microwell. Through the gas–liquid interface, the reactive species are supplied to the cells. Chlorella cells were used to demonstrate the feasibility of the device and after three minutes of plasma treatment, the fluorescence intensity of Chlorella cells appeared to be decreased. Optical emission spectroscopy identified O and OH radicals in the plasma, which can affect the cells. In the analysis of biological samples such as human cells or tissues, this device raises the possibility of revealing the mechanisms of plasma medicine in more detail.

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An atmospheric pressure inductively coupled microplasma source of vacuum ultraviolet light

Cited by 15 publications

References 29 publications

High-Performance Electron Field Emitters and Microplasma Cathodes Based on Conductive Hybrid Granular Structured Diamond Materials

High-Performance Electron Field Emitters and Microplasma Cathodes Based on Conductive Hybrid Granular Structured Diamond Materials

Stable Field Electron Emission and Plasma Illumination from Boron and Nitrogen Co‐Doped Edge‐Rich Diamond‐Enhanced Carbon Nanowalls

Development of plasma-on-chip: Plasma treatment for individual cells cultured in media

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