Lower turn-on field (E
TO)
and threshold
field (E
THR), as well as a higher current
density, are desired characteristics of materials and structures for
field emission (FE) applications. In this work, the properties of
a boron-doped diamond (BDD) hollow nanoneedle array (HNNA) structure
were remarkably enhanced through surface state modulation. By designedly
controlling the surface roughness and boron concentration of the BDD
film, a uniform and dense HNNA with a high aspect ratio (∼21.3)
was constructed by applying O2 + Cl2 inductively
coupled plasma reactive ion etching (ICP-RIE) for an optimal duration
(90 min). Although the maximum HNNA density (∼5.5 × 106 mm–2) is produced at a shorter duration,
the overall FE performance is even worse than that of the BDD film
without an HNNA, arising from the field shielding effect and incomplete
elimination of defective needles. The finally formed Actiniaria tentacle-like HNNA structure is associated with the masking role
of oxidized Si and amorphous carbon on the top edge of the needle
embryos, resulting from the electric field edge effect and Si supply
accompanying the substrate. Meanwhile, the sp2 carbon generated
by ICP-RIE on the surface of the as-etched HNNA promotes the FE, showing
a minimum E
TO of 0.11 V/μm. After
moderate hydrogen plasma treatment, owing to the negative electron
affinity (NEA) of C–H on p-type BDD with downward band bending
of the conduction band minimum and local electric field enhancement
induced by the hollow nanostructure, the hydrogen-terminated BDD–HNNA
shows excellent FE stability and a linear Fowler–Nordheim relation
with a lower E
TO of 0.38 V/μm and E
THR of 2.21 V/μm and a desirable current
density of 6532 μA/cm2 at 3.75 V/μm. The comprehensive
FE properties of the surface-modulated high-quality BDD–HNNA
exceed those of the vast majority of other conventional or popular
nanostructural counterparts.